Memoirs
Created 28.10.2008
Updated 25.3.2022
|
|
BOOKS
PETAR CHRISTOV PEYKOV
private collection
|
Biography
Field of research interests: Semiconductors, microelectronics, sensors, nanotechnologies, numerical and statistical modeling of semiconductor devices and technologies, data mining
Year and place of birth: 1939, Sofia
Education Petar Peykov graduated from Faculty of Physics, Sofia University “St. Kl. Ohridsky” in 1966. In 1973, he obtained PhD in Physics and Mathematics from the Institute of Semiconductors, Ukrainian Academy of Sciences, Kiev, Russia
Career: Institute of Physics, BAS - physicist; Institute of Solid State Physics, BAS - research associate; Institute of Microelectronics, Ministry of Electronics – 1-st deputy director, senior research assistant of 2nd degree; Universidad Autónoma de Puebla, Mexico – visiting professor; Instituto Nacional de Astrofísica, Óptica i Electrónica – senior researcher category “C”; SNI – researcher level II; Faculty of Physics, Sofia University – physicist
Teaching experience: He was lecturer more than 20 years in 8 different courses as: part – time lecturer in the Faculty of Physics, Sofia University, visiting professor in the Universidad Autónoma de Puebla, Mexico and in the Instituto Nacional de Astrofísica, Óptica i Electrónica, Mexico
Publications Over 123 scientific articles, 2 monograph, 9 Bulgarian patents and 2 in Russia
P. Peykov, Effects of some factors on pulse MOSC-t measurements, Äîêëàäè íà ÁÀÍ, 28, ñ. 1323 (1975)
P. Peykov, Photoelectric properties of MOS structures non-equilibrium conditions, Äîêëàäè íà ÁÀÍ, 28, ñ. 1319 (1975)
P. Peykov, Discharging of MNOS structures with thick oxide at higher temperatures, Äîêëàäè íà ÁÀÍ, 29, ñ. 175 (1976)
P. Peykov, On the nature of the negative charge in MNOS structures, Äîêëàäè íà ÁÀÍ, 29, ñ. 171 (1976)
P. Peykov, A. Vitkov, On the nature of the negative charge in MNOS structure, Comptes Rendus de l'ABS, 29(2) p. 171-173 (1976)
P. Peykov, A. Vitkov, M. Kaminova, G. Beshkov, V. Lazarova, Discharging of MNOS structures with a thick oxide at higher temperature, Comptes Rendus de l'ABS, 29(2) p. 175-177 (1977)
P. Peykov, The influence of process induced defects in the Si on surface charge in MOS structures, Thin solid films, 48(3) p. (1978)
|
|
|